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Course Description
 | Characterization of Thin Films by X-ray Diffraction & Fluorescence |
Date: 24 Oct 2003
1 day(s)
English STUniversity, Fuveau France
305,00 EURO
This six-hour course gives basic knowledge needed to understand which thin film parameters can be determined from x-ray scattering. A special emphasis will be given to the experimental setups required for each application.
*Fundamentals of x-ray diffraction
*Phase identification Preferred orientation:
What is crystallographic texture and how is it quantified? Strains and stresses
*Diffraction line profile analysis
*X-ray reflectivity: Density, roughness and thickness determination
*X-ray topography
*X-ray fluorescence
* Young engineers willing to acquire a specialization in microelectronics technologies and manufacturing management
* People with a recognized technical professional experience, willing to upgrade their knowledge with this officially accredited degree
* Companies wishing to train their newly hired engineers, or to prepare students to be hired by them.
Prof. Olivier THOMAS received a degree in engineering physics from Institut National Polytechnique de Grenoble in 1979 and a PhD in Materials Science in 1986 from the same institute. He is leading a research team in laboratoire TECSEN UMR CNRS 6122 focussed on stresses and microstructure in thin films and multilayers. Olivier Thomas is a member of the board of the new Electronic Materials and Processes Division of the French Vacuum Society.
Fabrizio Battaglia ST University Program Manager STMicroelectronics
Ph: +33 (0)4 42 53 54 59
Fax: +33 (0)4 42 53 54 72
fabrizio.battaglia@st.com
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